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2. Glass Etching The glass substrates of interest contain a significant amount of SiO2, with the rest of the constituents being various metal oxides. Naturally, an effective wet etch solution would start with hydrofluoric acid, which attacks the Si—O bond aggressively and etches SiO2 at a significant rate. Because of the presence of various metal oxides in glass, another acid such as HNO3 or HCl is usually added to the etch system to convert insoluble metal fluorides into soluble salts, thus reducing etch roughness (Kern and Deckert, 1978).

1990. A bulk silicon SOI process for active integrated sensors. Sens. Actuators A24:117–122. R. 1987. Audio frequency DSP laboratory on a chip-TMS32010. Proc. IECON ’87: 1987 Int. Conf. Industr. Electronics, Control Instrument. (Cat. CH2484–4) 2:1047–1051. Richards. 1997. A metallocene molecular gear. Tetrahedron Lett. 38:7805–7808. Stix, G. 1992. Micron machinations. Scient. Am. 267:106–117. Murakami, and Karube I. 1993. Micromachined detectors for an enzyme-based FIA. Appl. Biochem. Biotechnol.

Wise. 1990. A bulk silicon SOI process for active integrated sensors. Sens. Actuators A24:117–122. R. 1987. Audio frequency DSP laboratory on a chip-TMS32010. Proc. IECON ’87: 1987 Int. Conf. Industr. Electronics, Control Instrument. (Cat. CH2484–4) 2:1047–1051. Richards. 1997. A metallocene molecular gear. Tetrahedron Lett. 38:7805–7808. Stix, G. 1992. Micron machinations. Scient. Am. 267:106–117. Murakami, and Karube I. 1993. Micromachined detectors for an enzyme-based FIA. Appl. Biochem. Biotechnol.

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